マイクロ・ナノ工学シンポジウム
Online ISSN : 2432-9495
セッションID: 22am2-F5
会議情報
22am2-F5 ダイナミック電子線リソグラフィによる2次元ナノ流体制御
宮廻 裕樹間渕 邦彦星野 隆行
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会議録・要旨集 フリー

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抄録
This study proposes the generation method of a nanoscale focused electric field by direct irradiation of electron-beams into dilution, and its application for two-dimensional control of nanofluidics. A negative charges induced by electron-beams irradiation for 100-nm-thick SiN membrane generated a focused electric field around the irradiation point, and the electric field could cause electroosmotic flow, which was large enough to transport 240-nm-diameter polystyrene particles in water. The electron-beam blanking could switch the presence of induced electric field. These results showed that our electron beam lithography system achieved the dynamic control of nanofluidics by fast scanning and blanking of electron beams.
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