薄膜多層スプレー塗布による超厚膜レジストの成膜

抄録

In this paper, we propose a thin film multi-layer spray coating method to form an ultra-thick photoresist film with over 400 μm thickness. By the multi-layer spray coating with a thin layer made of negative photoresist SU-8 with the thickness of 2.6 μm, we realized the approximate 450 μm thickness film with small roughness and uniform film surface. In addition, we verified the suitable deposition thickness for forming ultra-thick film by evaluating the surface properties of the coated film in the change of the layer thickness. We concluded that the thin film multi-layer spray coating is suitable for thick and ultra-thick film forming and further improvement is possible by the optimization of the baking process throughout the multi-layer coating.