抄録
Using an arc ion plating process, crominum nitride films were deposited under a variety of process parameters onto stainless steel substrate. To clarify the effect of process parameters, (are arc current, bias voltage and nitrogen gas pressure) on film quality. The mesurements of the micro particle distribution on film surface were performed. The results obtained were as follows; (1)With the increase in the Nitrogen gas pressure, the micro particle number increases., (2) Under arc current over 100A, the particle number remarkably decreases, (3)The micro particle number slightly increases when the bias voltage decreases. These results seem to result from evaporation and melting behavior of the cathode metal.
