熱工学コンファレンス講演論文集
Online ISSN : 2424-290X
セッションID: F132
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高速滴下法による球状Si結晶成長(オーガナイズドセッション4 材料創成プロセスと熱工学)
葛岡 義和千津井 勝巳明石 義弘磯前 誠一山口 由岐夫
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Spherical silicon can be produced directly by passing molten silicon through capillary with pressurized inert gas. Molten silicon passing through capillary forms jet and the jet is split into droplets by the hydrodynamic instability. This method can produce spherical silicon at ultra-high speed (600-1000 of spherical silicon per second). Spherical silicon produced by this method are known to be generally polycrystalline. Some of spherical silicon consist of 2-4 grains. In this report, we find that the generation probability of spherical silicon with 2-4 grains increased with decreasing cooling rate of spherical silicon. In the early condition of dropping spherical silicon, the cooling rate of spherical silicon was estimated to be between 600 and 800℃/sec
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