抄録
Site-selective deposition of polymer thin film on well-defined patterned self-assembled monolayers has been paid great attention these days. The purpose of this study is to establish the fundamental technology of site-selective deposition of polymer thin film utilizing wetting contrast of patterned fluoroalkylsilane monolayer (R_f)/silanol(Si-OH) surfaces. R_f/Si-OH patterned surface (line, square) prepared by the VUV-rays or EB lithography have liquidphobic R_f and liquidphilic Si-OH phases, respectively. Polystyrene xylene solution was deposited on the patterned surface with wetting contrast by ink-jet method. The patterned polystyrene ultrathin films were selectively formed on liquidphilic areas.
