抄録
This study was searched for the possibility of high deposition rate by the gas jet stream in the non-equilibrium plasma CVD with little power consumption. On high pressure and narrow gap conditions, it has checked obtaining a high deposition rate (several μm/s) locally using a single axial symmetry nozzle. Well, the dynamic deposition method was adopted using a high deposition rate for large area-deposition. And the possibility of uniformity of the film thickness in the direction of movement was found out. In order to enlarge the uniform deposition area to a meter scale thin film, we have started the experimental study by a two-dimensional slit nozzle (3×0.3mm^2) instead of 0.5mmφ single nozzle. In this paper, we report the experimental study result.
