金属薄板生成過程の電磁気圧印加時の発熱に対する冷却条件の検討

抄録

This study proposes a new method for producing silicon crystal substrates utilizing surface tension and electromagnetic pressure. In our previous model experiments with a special alloy under the condition that an alternating current of 361 kHz was applied, producing substrate failed due to overcooling. It was considered that production of substrates can be expected by increasing heat generation. In this study, heat generation and electromagnetic pressure when frequency was increased to 407 kHz were calculated with magnetic field analysis software. In addition, the optimum velocity of cooling wind for the heat generation was calculated with thermo-fluid analysis software and applied to the producing substrate process.