材料
Online ISSN : 1880-7488
Print ISSN : 0514-5163
ISSN-L : 0514-5163
論文
ゾルゲル法を用いた三酸化タングステン薄膜の作製と評価
小池 一歩村上 聡岩田 知也亀井 龍真矢野 満明
著者情報
ジャーナル フリー

2018 年 67 巻 9 号 p. 849-853

詳細
抄録

This paper describes characteristics of the tungsten trioxide (WO3) films fabricated on a glass substrate by a sol-gel spin-coating method. Ammonium meta-tungstate (AMT) and poly-vinyl alcohol (PVA) were used as the solute and stabilizer materials, respectively. The advantage of AMT is the high solubility in water, giving the capability for highly concentrated and alkali-metal-free aqueous solution. The fabricated films were characterized by x-ray diffraction, atomic force microscopy, optical transmittance spectroscopy, and Hall-effect measurement. By sintering the spin-coated solution in air, α-axis oriented orthorhombic-phase polycrystalline WO3 flat films were obtained with a bandgap energy of ∼2.8 eV and a relatively high electron mobility of ∼30 cm2/Vs. These results indicate that the sol-gel spin-coating method can be promising for the fabrication of semiconducting WO3 films to apply electronic devices.

著者関連情報
© 2018 日本材料学会
前の記事 次の記事
feedback
Top