材料
Online ISSN : 1880-7488
Print ISSN : 0514-5163
ISSN-L : 0514-5163
論文
有機薄膜トランジスタ用ポリシルセスキオキサンゲート絶縁膜の紫外線重合における光重合開始剤の検討
秦野 航輔中原 佳夫宇野 和行田中 一郎
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2020 年 69 巻 10 号 p. 712-716

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We fabricated pentacene thin-film transistors (TFTs) with ultra-violet (UV) light cured polysilsesquioxane (PSQ) gate dielectric layers using different photo-initiators to reduce UV-curing time. When PSQ layers were cured using IrgacureTM 184 as a photo-initiator, it took 60 minutes to cure them completely. However, the curing time was reduced to be 10 minutes when IrgacureTM 907 was used with a sensitizer because the UV light was absorbed more efficiently. It was also demonstrated that the hole mobility of the pentacene TFTs was not affected by changing the photo-initiator from IrgacureTM 184 to IrgacureTM 907 with a sensitizer.

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