小特集 「リソグラフィ用EUV（極端紫外）光源研究の現状と将来展望」
リソグラフィ用 EUV(極端紫外)光源研究の現状と将来展望 6.EUVA における光源開発と産学連携について
2003 年 79 巻 3 号 p. 257-260
詳細
2003 年 79 巻 3 号 p. 257-260
The extreme ultraviolet (EUV) light source development project of the EUVA and the research collaboration between industry and universities are described. The development of EUV light sources using both laser produced plasma and discharge produced plasma is currently under way. The goal of four-year project is to attain 10 W output power at an intermediate focus point which should satisfy all the requirements of the EUV lithography light sources. The collaboration with universities will expand next year under the new research framework of the leading program of laser-based EUV sources.
