抄録
Some important issues for the practical application of a discharge-basedEUV source for lithography are described. Innovative ideas taking into consideration both plasma physics and technological elements such as pulse power, materials, and heat management are required for the solution of key issues. Engineering approaches are described with the development plan of the EUVA. It is necessary to consider the factors relating to the issue as a whole in research and development in order to produce a clean, high power and high quality photon.
