プラズマ・核融合学会誌
Print ISSN : 0918-7928
小特集 「プラズマにおける分子分光計測の手法と実際」
プラズマにおける分子分光計測の手法と実際 4. The Role of Molecular Spectroscopy in the Vacuum Ultraviolet Region for the Development of a Negative Ion Source
Masaki NISHIURA
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ジャーナル フリー

2004 年 80 巻 9 号 p. 757-762

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抄録
Fundamental plasma processes of negative ions in a low pressure region (a gas pressure Pg < 1.5 Pa) have been studied using the photodetachment technique and vacuum ultraviolet (VUV) spectroscopic measurements in the spectral range from 100 to 180 nm. Understanding the behavior of a plasma with negative ions, in particular, the correlation between H- density and vibrationally excited H2 density, is of great interest in the field of atomic-molecular physics and ion source developments. The volume and the surface effects of negative ions are discussed taking into account the e-V, the E-V, and the RD processes, and the measured VUV spectrum is compared with the synthetic one. The cascade transition to the B1Σ+u state by the electron excitation contributes to the production of the highly vibrationally excited levels of the X1Σ+g ground electronic state.
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© 2004 by The Japan Society of Plasma Science and Nuclear Fusion Research (Japanese)
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