プラズマ界面における異常発光とフラグメンテーション

抄録

Anomalously strong optical emission from the excited CH radical was obserbed near the negatively biased electrode in a CH₄/Ar glow plasma. The time evolution of the CH emission depends on the material and the surface state of the electrode as well as the applied bias voltage. A possibility of the anomalous emission by secondary electrons was denied from Monte Carlo simulation of the process. The experimental observations and calculations revealed the CH radical formation by two surface processes: fragmentation of hydrocarbon particles (ions and neutrals) at their impact on the cathode, and sputtering of the already deposited carbon film. These processes are essential for understanding the redeposition mechanisms in carbonized environement.