核融合研究

核融合炉第一壁のin situコーティング

菅井秀郎

1992 年 67 巻 1 号 p. 12-29
発行日: 1992/01/25
公開日: 2010/10/22

DOIhttps://doi.org/10.1585/jspf1958.67.12

ジャーナルフリー

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A review of the different techniques for in situ coatings of magnetic fusion devices will be given focusing on the recent development of boronization. Firstly, merits of in situ coatings, selection of low Z material, and metallic getters (Ti, Cr, Be) are described. Secondly, the reduction mechanisms of oxygen impurity by boronization and Be getter will be discussed. Thirdly, practical problems of carbonization and boronization (pure B and B/C films) are presented, together with a new proposcal of B/N film coating. Finally, in situ etching techniques of carbon and boron thin films will be summarized.

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閉じ込め特性

I. 現象と観測

伊藤公孝, 伊藤早苗

1992 年 67 巻 1 号 p. 30-50
発行日: 1992/01/25
公開日: 2010/10/22

DOIhttps://doi.org/10.1585/jspf1958.67.30

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Experimental observations on plasma confinement are reviewed. The confinement times of the energy, fuel particle, ash and impurities are outlined. The encounter with the anomalous transport and the trials to overcome it are retraced. Methods to study confinement problems are presented: Investigations on the global confinement time, the plasma profile and the transport coefficient are presented. The characteristics of the phenomena in the core plasma and in the edge plasma are shown. Improved confinement physics is reviewed. Fast particle loss is also briefly discussed.

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プラズマ界面における異常発光とフラグメンテーション

片寄恭一, 豊田浩孝, 菅井秀郎

1992 年 67 巻 1 号 p. 51-61
発行日: 1992/01/25
公開日: 2010/10/22

DOIhttps://doi.org/10.1585/jspf1958.67.51

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Anomalously strong optical emission from the excited CH radical was obserbed near the negatively biased electrode in a CH₄/Ar glow plasma. The time evolution of the CH emission depends on the material and the surface state of the electrode as well as the applied bias voltage. A possibility of the anomalous emission by secondary electrons was denied from Monte Carlo simulation of the process. The experimental observations and calculations revealed the CH radical formation by two surface processes: fragmentation of hydrocarbon particles (ions and neutrals) at their impact on the cathode, and sputtering of the already deposited carbon film. These processes are essential for understanding the redeposition mechanisms in carbonized environement.

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