Journal of Smart Processing
Online ISSN : 2187-1337
Print ISSN : 2186-702X
ISSN-L : 2186-702X
Quantification of Thermal Fluctuation Behavior in Chip on Wafer Process by Thermo-fluid Analysis
Daisuke SAKURAI Masaru HAMAHIRAMai SHIBATAHiroshi NASUShinji FUKUMOTOKozo FUJIMOTO
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2019 Volume 8 Issue 2 Pages 65-72

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Abstract
Recently, demand for the fan-out wafer level package is increasing because the market of IoT(Internet of Things)devices is expanding. Especially, higher accuracy and higher productivity are required for the chip-on-wafer bonding process. However, the process has the issue about the recognition accuracy caused by heat haze on the heated wafer. Therefore, the authors examined the quantification of thermal fluctuation behavior which fluctuates due to the temperature of wafer and jet flow by the thermo-fluid analysis. The bonder units such as bonding head, wafer and camera were modeled to clarify the thermal fluctuation behavior in the die bonder. The influence of the heated wafer and jet flow on the velocity and temperature of air was evaluated by the thermo-fluid analysis. Furthermore, the validity of the analysis was verified by the particle image velocimetry(PIV).
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© 2019 Smart Processing Society for Materials, Environment & Energy
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