2012 年 33 巻 3 号 p. 159-164
For the further understanding of the material combination between silicon and gold, it is necessary to study silicon-gold interface at the nano scale. For this purpose, we originally built an experimental setup with a micro electric mechanical system (MEMS) probes and a transmission electron microscope (TEM). Thanks to this setup, nanoscaled interfaces were formed under in-situ TEM observation. At the nanoscaled silicon-silicon and gold-gold interfaces, nanocontacts were formed just with a mechanical contact and grown by the surface diffusion. At the interface between gold and silicon, gold and silicon diffused each other at room temperature. The activation energy to diffuse gold into silicon was 0.21 eV, which was matched well with those of bulk experiments.