表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
特集: 偏光ツールの最前線
偏光解析法の基礎と応用
川畑 州一
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ジャーナル フリー

2014 年 35 巻 6 号 p. 286-293

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Ellipsometry is widely used as a powerful tool in the research of nano-science and the thin film engineering. The thickness of the film of sub-nm order can be measured by ellipsometry with high accuracy along with its refractive index. Ellipsometry is a non-destructive method and is ambient free in the measurement. Nowadays, its applications range over a variety of field. This article describes an introduction to ellipsometry with some its applications. And the perspective of ellipsometry is also briefly summarized.

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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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