ヘリウムイオン顕微鏡によるナノデバイス材料の評価と加工

抄録

A helium ion microscopy (HIM) was developed in 2006, and since then applications of the HIM technology have been eagerly studied at more than 20 organizations in the world. Several unique applications have been developed at AIST. In comparison with electron, helium ion has larger cross section, and it realized HIM observation of samples with less current because of higher efficiency of secondary electron generation for imaging, which results in less power implant (less thermal damage input) into the samples. At the same time helium ions penetrate deeper than electrons at optimal observation conditions. Utilizing these features, a soft material such as a low-k dielectric pattern and a Cu metal line underneath a 130 nm dielectric were imaged with less deformation (thermal damage). A few-40 nm diameter tungsten pillars were deposited under the helium ion beam irradiation in W(CO)₆ gas atmosphere with high special resolution accuracy. The helium ion irradiation onto a graphene film could introduce defect in the film which control a conduction properties of the graphene. Possibility of ion beam luminescence was shown.