Formation of Atomically Step-free Surfaces and Interfaces by Surface Control Utilizing Surface Photo-absorption Measurement

Toshio NISHIDA; Naoki KOBAYASHI

doi:10.1380/jsssj.20.20

表面光吸収法を用いたステップフリー表面・界面の形成

西田敏夫, 小林直樹

著者情報

ジャーナルフリー

1999 年 20 巻 1 号 p. 20-26

DOI https://doi.org/10.1380/jsssj.20.20

詳細

発行日: 1999/01/10 受付日: 1998/08/31 J-STAGE公開日: 2009/08/07 受理日: - 早期公開日: - 改訂日: -
訂正情報
訂正日: 2009/08/07 訂正理由: - 訂正箇所: 論文抄録訂正内容: Wrong : By in-situ surface photo-absorption (SPA) monitoring of MOVPE grown GaAs(111)B surface, three types of surface phases, (2×2)-like, (√19×√19)-like, and (1×1)HT-like, are identified. Eight-μm-wide atomically step-free surfaces and interfaces are successfully obtained by controlling the surface phase and by using finite area epitaxial (FAE) growth. Their flatness is confirmed by ex-situ AFM and low-temperature (4K) spatially resolved photoluminescence (SR-PL) measurement. A flattening principle of FAE is discussed, where two-dimensional (2D) nucleation is suppressed on GaAs(111)B surface due to desorption and surface migration. It is concluded that, by utilizing desorption, a step-free surface of any size can be formed as long as the size is finite. To demonstrate this, an extraordinarily wide step-free GaAs(111)B surfaces 100μm in diameter are successfully formed. Surface stoichiometry control based on insitu SPA monitoring is indispensable for flatness control.
Right : By in-situ surface photo-absorption (SPA) monitoring of MOVPE grown GaAs(111)B surface, three types of surface phases, (2×2)-like, (√19×√19)-like, and (1×1)HT-like, are identified. Eight-μm-wide atomically step-free surfaces and interfaces are successfully obtained by controlling the surface phase and by using finite area epitaxial (FAE) growth. Their flatness is confirmed by ex-situ AFM and low-temperature (4K) spatially resolved photoluminescence (SR-PL) measurement. A flattening principle of FAE is discussed, where two-dimensional (2D) nucleation is suppressed on GaAs(111)B surface due to desorption and surface migration. It is concluded that, by utilizing desorption, a step-free surface of any size can be formed as long as the size is finite. To demonstrate this, an extraordinarily wide step-free GaAs(111)B surfaces 100μm in diameter are successfully formed. Surface stoichiometry control based on insitu SPA monitoring is indispensable for flatness control.

抄録

By in-situ surface photo-absorption (SPA) monitoring of MOVPE grown GaAs(111)B surface, three types of surface phases, (2×2)-like, (√19×√19)-like, and (1×1)HT-like, are identified. Eight-μm-wide atomically step-free surfaces and interfaces are successfully obtained by controlling the surface phase and by using finite area epitaxial (FAE) growth. Their flatness is confirmed by ex-situ AFM and low-temperature (4K) spatially resolved photoluminescence (SR-PL) measurement. A flattening principle of FAE is discussed, where two-dimensional (2D) nucleation is suppressed on GaAs(111)B surface due to desorption and surface migration. It is concluded that, by utilizing desorption, a step-free surface of any size can be formed as long as the size is finite. To demonstrate this, an extraordinarily wide step-free GaAs(111)B surfaces 100μm in diameter are successfully formed. Surface stoichiometry control based on insitu SPA monitoring is indispensable for flatness control.

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