表面科学
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
シリコン表面の未結合ボンドでの初期酸化反応
梶山 博司平家 誠嗣橋詰 富博加藤 弘一内山 登志弘宇田 毅
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1999 年 20 巻 10 号 p. 711-715

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The oxidation reaction of an unpaired dangling bond (DB) and a DB atomic wire on a hydrogen-terminated Si(100) 2×1 surface was studied using an ultrahigh-vacuum scanning tunneling microscopy. We found that O2 molecules dissociated into atomic oxygen after reacting with DBs. The atomic oxygen oxidized also the bonds near DBs. The oxidation reaction was turned to be considerably enhanced at the DB atomic wire, compared with that at an unpaired DB. This suggests that the electron transfer to anti-bonding π orbital of O2 molecule depends on the local density of states at an unpaired DB and at a DB atomic wire.

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