Some properties of films deposited by sputtering are discussed. (Chap. 2); The construction of the sputtering systems are explained. (Chap. 3); Sputtering yield, sputtered pacticles, mean free path, sputtering atmosphere, and sputtered film are discussed in detail on the basis of sputtering. The energy of the sputtered particles is considered to be the most essential factor. (Chap. 4); The c-axis oriented ZnO film and the amorphous PbTiO3 film were studied as examples of thin films prepared by sputtering.
