抄録
Scanning Electron Microscope (SEM) has been widely used as valuable tools to study the problems involved in pulp and paper production. Recently, informations of microstructures at much higher magnifications are required than those obtained by conventional SEM. Field-Emission-SEM (FE-SEM) and Atomic Force Microscope (AFM) are thought to be very effective for this purpose. AFM of which the principle is quit different from SEM was first developed in 1986 and has made rapid progress to assess the surface topography of such industrial materials as semiconductor, liquid crystal display etc.
In this paper, the principle and mechanism of FE-SEM and AFM were briefly described and several examples of them applied to pulp and paper specimens were demonstrated.
