抄録
An Electron beam ion source was developed for the application to nanoprocesses using highly charged ions. The ion source has been modified from the original design to approach the designed value of electron beam current, and presently the ion source can be operated with electron beam current up to 150 mA. Ion beam intensity of Arq+ with relatively lower charge states (q<13) exceeds 1 nA, however higher charge states are suppressed due to the presence of residual gases.
