大体積イオンプレーティングのための大直径プラズマ

抄録

First, a large diameter plasma with a uniform density (above 10 cmφ) is produced in a dc discharge by utilizing a magnetic field composed of a circular ferrite permanent magnet and usual magnetic coil, whose magnetic field guides the dc discharge through two intermediate electrode from a cathode to a large cylindrical anode and is reduced abruptly in the anode region to guide the discharge quickly toward the radial direction.
Next, in order to apply this plasma source for the ion plating of large space, the large diameter plasma is focused in a short distance on a hearth by arranging another permanent magnet under the hearth, while the cylindrical large diameter anode is floated electrically and the dc discharge power is almost concentrated to the hearth.Thus, we can utilize a high density plasma region over a large space of ion plating in comparison with an ordinary method in which only a diffusional plasma region from a small plasma column is used.