プラズマ中蒸着によるLiNbO₃薄膜の作製と構造

抄録

The structure of LiNbO₃ films formed by plasma-assisted deposition (PAD) is described in relation to the surface roughness and epitaxy of the films.
At the substrate temperature of about 20 °C, the films grow with poly-crystalline on MgO and CaF₂ cleaved surfaces. The surface roughness is within 200Å, which is nearly equal to the particle size of the films.
By raising the substrate temperature, it is observed that the columnar particles begin to grow epitaxially on the surface of the film.
These particles, however, disappear almost completely if the bias voltage of-600 V is applied to the substrate holder. The surface roughness of the film is estimated to be about 300 Å from SEM photographs. The bias voltage gives no drastic change in epitaxy.