Abstract
The yield of sputtering and secondary ion emission of metals under oxygen ion bombardment were simulta-neously measured for multilayer targets with a known layer thickness. The sputtering yield of each layered metal was determined by the time to sputter away the thin film.
The experimental results revealed that the sputtering yields of metals were primarily explained by Sigmund's theory and a linear relationship was found between the ionization potential and modified degree of ionization which can be expressed by the ionization potential and the secondary O2+current.
