抄録
A simple and stable device for monitoring thickness of multilayer films deposited in vacuo was constructed. The device was intended to be used at a workshop. Transmittance or reflectance of a multilayer film varies rapidly at the neighbourhood of boundaries of its stop-band. We can control precisely the thickness of individual layer by comparing the intensity of the two rays, whose wavelengths are coresponding to the neighbourhood of both boundaries of the stop-band. Details of the design and the performance of the apparatus are described. Reproducibility of this apparatus was tested and the result was quite satisfactory.
