全アルミニウム合金製小型スパッタ装置の超高真空特性
1988 年 31 巻 9 号 p. 805-807
詳細
1988 年 31 巻 9 号 p. 805-807
An all aluminum alloy equipment has been developed for a sputtering deposition of high quality thin films. The equipment is consist of an aluminum alloy sputter chamber with TiN coating, an aluminum alloy cryopump and an oil-free roughing pump system. It is interesting to investigate a pumping behavior and an ultra-high vacuum property of the equipment. The pressure in the sputter chamber could be lowered to 1.3 × 10-8 Pa (9.7 × 10-11 Torr) after a bakeout of 130°C × 46 hours.
