抄録
We have developed plasma enhanced chemical vapor deposition system, which can be operated with the low pressure and the low voltage. On the optimal conditions, conical shaped nanostructures with about 1 μm height and 5 × 106 cm-2 in number density were grown on Ni/Si substrate by this system. Furthermore selective growth of conical shaped nanostructures was occurred by using Ni patterned substrate. The obtained conical shaped nanostructures had good emission properties.
