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Online ISSN : 1880-9413
Print ISSN : 0559-8516
ISSN-L : 0559-8516
Si (100) 表面におけるBiナノワイヤ形成過程の走査トンネル顕微鏡観察
大垣 真治武井 孝樹内藤 正路西垣 敏大石 信弘生地 文也
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2003 年 46 巻 6 号 p. 501-504

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Bi atoms deposited on the Si (100) surface at temperatures higher than 400°C, form one-dimensional wires consisting of two chains of Bi dimers in the topmost layer. The dynamic process of Bi-nanowire formation has been investigated by scanning tunneling microscopy (STM) by performing in-situ observations at elevated temperatures. From the consecutive STM images taken after Bi deposition on the surface, we found that Bi-nanowires are formed by expelling atoms that compose an upper terrace at the front of Bi-nanowire growth. When Bi-nanowires are formed toward a lower terrace approaching its step edge, peninsulas are newly formed near the wires.

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