In order to minimize contributions to global warming, it is important to develop a Perfluorocompounds (PFCs) abatement system that can remove PFCs effectively with low electric power. We have developed a new PFCs abatement system consisting mainly of a 2 MHz ICP plasma source and two CaO columns operated at low pressure. The CaO agent developed for this system has a specific surface area of 60-80 m2/g and a grain diameter of 2-6 mm, simultaneously. Reactive fluorinated compounds are immobilized in the CaO columns without a water scrubber to prevent the recombination of fluorocarbons. Stable compounds such as CF4 are decomposed by the 2 MHz ICP plasma before introducing in the second CaO column. When the emissions from a fluorocarbon film chemical vapor deposition process chamber were treated by this abatement system, PFCs removal efficiency and CO2 equivalent removal efficiency was 99.96% and 93.5%, respectively.
