Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
解説
グラフェンと h-BN の化学気相堆積膜
小田原 玄樹大島 忠平
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ジャーナル フリー

2010 年 53 巻 2 号 p. 66-72

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抄録
  We have reviewed graphene and h-BN films grown on various metallic surfaces by using chemical vapor deposition techniques. In particular, a Ni(111) surface is an excellent substrate, on which the graphene grows in the epitaxial and commensurate way. Some properties on solid surface, such as electronic bands and phonon dispersion are shown. The chemical etching process to remove the Ni substrate makes it possible to prepare a self-supporting graphene film.
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© 2010 一般社団法人日本真空学会
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