Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
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新材料合成用電子サイクロトロン共鳴イオン源のプラズマ評価
田中 清勝内田 貴司峰崎 英和内山 英史浅地 豊久村松 正幸北川 敦志加藤 裕史吉田 善一
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2010 年 53 巻 3 号 p. 169-171

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  An electron cyclotron resonance ion source (ECRIS) has been designed and developed for a synthesis of new materials such as endohedral metallofullerenes. The plasma chamber diameter is 140 mm in order to produce large m/q ions, like singly charged C60 ions effectively. In this study, we examined the performance of our ECRIS by plasma measurements using a Langmuir probe. The plasma density increased with increasing Ar pressure and reached to 6.1×1017 m-3 at a pressure of 5.0×10-3 Pa. The plasma was produced over a large volume compared with conventional ECRISs.
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© 2010 一般社団法人日本真空学会
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