抄録
Thermal degradation property of fluorocarbon thin film prepared by an r.f. sputtering and poly (tetrafluoroethylene) (PTFE) thin film prepared by a spin coating technique was analyzed with a micro sampling mass spectroscopy and an effect of atomic oxygen exposure on the property of these thin films was evaluated. Main thermal degradation products of the PTFE thin film are C2F4 and C2F3, however those of the fluorocarbon thin film are CO2, CF3 and C4F7. Fragments which represent CF3, C2F5, C3F7, C3F5, C4F7 were observed in the spectrum of sputtered fluorocarbon thin films, while they were hardly obaserved in that of PTFE thin film. It is considered that these fragments would relate the thermal stability of the fluorocarbon thin film.
