Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
講座
成膜の基礎
鈴木 基史
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ジャーナル フリー

2014 年 57 巻 8 号 p. 303-307

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  Thin films have recently emerged as one of the most important building blocks of nanotechnology and are often prepared under vacuum conditions. For efficient production of high-quality thin films, it is important to understand the impact of the vacuum on each stage of the thin film deposition processes, including decomposition of the starting material, transport of its vapor, and deposition. This article discusses the general key aspects of the thin film deposition process from the viewpoint of vacuum science and technology.

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