抄録
Recent progress of cluster ion beam was overviewed. Various applications, such as nano-fabrication and biological material analysis, have been developed by using cluster effects, which are due to high-density and multiple collision between cluster ion and surface. Control of size and energy of cluster beam is essential. High speed etching with high anisotropy is realized with neutral cluster beam, which has very low energy/atom. Both molecular depth profiling of organic multilayer and high resolution molecular imaging were demonstrated by using cluster ions. These new XPS and SIMS techniques provide new opportunities for polymer, molecular electronics, biological materials and life science.
