2017 年 60 巻 12 号 p. 463-466
Ion implantation into microspheres and wires may open a new application field. Therefore, we extended the TRIM (Transport of Ions in Matter) code that simulates ion distributions for substrates to be applicable to spherical and cylindrical targets. Next, we fitted simulated profiles calculated by the TRIM code to the experimental ones to determine adequate parameters of electronic stopping powers. And, we simulated about various combinations to use the extended TRIM code which used parameters. Calculated projected ranges and implantation energies are reduced to modified reduced projected ranges and average reduced energy. Also, we derive the relations between the average reduced energy and the modified reduced projected ranges for spherical and cylindrical targets.