Journal of the Vacuum Society of Japan
Online ISSN : 1882-4749
Print ISSN : 1882-2398
ISSN-L : 1882-2398
解説
4H-SiCエピ層中の転位
坂 公恭
著者情報
ジャーナル フリー

2017 年 60 巻 8 号 p. 285-291

詳細
抄録
 Properties and behavior of dislocations in 4H-SiC are presented based on classical theory of dislocations. 1) A new symbol which is an extension of the famous Frank symbol is introduced to explain complex stacking sequence in SiC polytypes. 2) A basal plane dislocation (BPD) is dissociated into two Shockley partials. Polarity of BPD is described. 3) Principles to assign Burgers vectors and polarity to the individual Shockley partials are derived. 4) Threading screw dislocations (TSD) can be dissociated into four partials, thereby reducing the total energy considerably. 5) Deviation of threading dislocations (TD) from the exact [0001] orientation is reasoned from the viewpoint of energy consideration. 6) Transition from BPD to threading edge dislocations (TED) is explained by taking into account effects of the crystal surface. All of behavior can be explained quite well in terms of classical theory of dislocations.
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© 2017 一般社団法人日本真空学会
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