Abstract book of Annual Meeting of the Japan Society of Vacuum and Surface Science
Online ISSN : 2434-8589
Annual Meeting of the Japan Society of Vacuum and Surface Science 2020
Session ID : 1Ea08
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Structure of DC magnetron sputtering discharge with negative plasma potential
*Eiji Kusano Kusano
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Abstract

Based on plasma quantities of the Mg-CF4 DC discharge, which is assumed to be a typical electronegative discharge, measured by a single Langmuir probe method as a function of CF4 / (Ar + CF4) discharge gas ratio, the discharge structure of electronegative Dc magnetron sputtering discharge with negative plasma potential, such as cathode sheath potential differnce, anode sheath difference, will be discussed. In addition, reasons of asymmetry of probe current-voltage characteristic which is in contradiction with the change in negative ion/electron ratio in the probe current will be discussed.

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© 2020 The Japan Society of Vacuum and Surface Science
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