Abstract
We focused on Shirasu, a volcanic eruption unique to southern Kyushu, as a new antifogging material. To date, we have confirmed that the film exhibits superhydrophilicity when thinned by the sputtering method. The superhydrophilic property can be applied to antifogging technology, but maintaining the antifogging property has been an issue. We have been trying to maintain the antifogging property for a long time by making the thin film structure porous using the phase separation phenomenon of glass. However, the phase separation phenomenon, which generally requires heat treatment, cannot be applied to substrates with poor heat resistance, for which demand is increasing. The purpose of this study is to develop a phase separation sputtering technique for Shirasu thin films at low temperatures. Instead of thermal energy, we attempted to utilize the kinetic energy of the sputtered particles which affects the thin film structure. Specifically, the effect of deposition conditions on the kinetic energy of sputtered particles and the variation of the component chemical composition ratio of the thin film with respect to the kinetic energy were investigated.
