Host: The Japan Society of Vacuum and Surface Science
In this study, we fabricated titanium dioxide (TiO2) films using reactive sputter-deposition with carbon monoxide (CO) gas diluted by argon gas. The concentration of CO was calculated with CO partial pressure respect to the total pressure. The films fabricated with CO 6% showed low transparency but they had lower resistivity (0.1 Ωcm) than the value of non-doped films in other report. The resistivity kept approximately constant after heat treatment at lower temperature than 400°C. The films, however, changed into the insulating 80% transmission films after heat treatment at 600°C. According to analyses of X-ray diffraction, it was found that the crystal structure of the CO 6% films was rutile TiO2 after heat-treated at 600°C, on the other hand, the films with CO 40% showed anatase TiO2 after heated at 600°C. The films with each CO concentration still maintained amorphous after heat-treated at lower temperature than 400°C.
