光弾性被膜法に関する二, 三の問題について

抄録

In the photoelastic apparatus of reflection type, a half mirror will be used sometimes in the light path to turn the polarized light at right angle, and in this case the polarization effect due to the mirror cannot be neglected usually. In the present paper, the conditions which must be satisfied to avoid the effect, have been considered theoretically and a new convenient method applicable to this case has been proposed. On the other hand, some attentions are paid to the stress analysis in the homogeneous anisotropic material by the use of a birefringent coating, and a new method applicable to any bodies, which are in the state of plane stress and obey Hooke's law, has been presented.