マグネトロンスパッタリングのモンテカルロ法による研究
1993 年 59 巻 568 号 p. 3809-3816
詳細
1993 年 59 巻 568 号 p. 3809-3816
Argon plasma in a DC magnetron sputtering apparatus with a practical magnet system is analyzed by simulating the motion and collision of electrons and ions. The effects of the pressure and the magnetic field on the erosion distribution of the target are examined in detail. It is found that not only the strength but also the form of the magnetic field has a great effect on the erosion distribution.
