アルミナ溶射皮膜の電気的・機械的特性評価

抄録

In state-of-the art semiconductor manufacturing equipments such as Etch, CVD and PVD chambers, it is very important to consistently fix silicon wafers on the susceptor. The electro-static chuck is used for the susceptor. The main functions are to improve the accuracy of positioning and temperature controlling. In this study, Al₂O₃ coatings were developed using Atmospheric Plasma Spray (APS) and Vacuum Plasma Spray (VPS) and their basic electrical and mechanical characteristics were investigated. In the investigation, several characteristics of Al₂O₃ coatings by using both plasma spraying processes were resembled. It was found that the dielectric constant value of the APS Al₂O₃ coating is higher than that of the VPS coating below 373K. APS'ed coatings also had the advantage of thermal conductivity in the range of from 373K to 500K over the VPS'ed coating. The results showed that APS'ed coatings have advantages over VPS'ed coatings for electro-static chucks. The results also suggest the feasibility for using the APS'ed Al₂O₃ coatings as a dielectric layer on electro-static chuck