1990 年 56 巻 526 号 p. 1608-1613
Diamond is the ultimate material for cutting tools, insulators, heatsinks, semiconductors, and protecting films etc. because of its superior characteristics. The application of diamond has been mostly limited to cutting tools so far because natural diamonds or diamonds deposited at high pressures are particles with limited size. Recently, however, diamond has been deposited in the vapour phase and it has been possible to coat some materials with diamond. In this study, special attention is paid to the surface properties of the substrate which have an effect on the nucleation of diamond in the vapour phase. The nucleation mechanism is investigated from the view point of substrate surface states and substrate material.