Abstract
This paper is describing the formation of laminated photocatalytic sheets and the effect of UV-light irradiation. A TiO2/PVDF bilayer structure is compared with a TiO2/SiO2/PVDF trilayer structure. When irradiated for 1000 h with UV-light, the transmittance decreases in a bilayer structure sheets caused by a chalking effect of the PVDF layer. In the case of the trilayer structured sheets, however, the chalking of the PVDF layer is completely suppressed because of the SiO2 barrier layer. In this study, because the process temperature is limited to 100°C due to thermal degradation of PVDF, the TiO2 films include titanium chelate intermediates. These intermediates photopolymerize during the initial stage of UV-light irradiation and, as a result, TiO2 films shrink and give stress to the interface between TiO2 and PVDF. It is found that the SiO2 barrier layer also functions as a stress compensation layer.
