Study of Plasma Polymerization Process with Organosiloxanes and Nitrogen-Containing Compounds

Abstract

Plasma polymerization to form thin films on substrates was carried out with three organosiloxanes (hexamethyldisiloxane, hexamethylcyclotrisiloxane, and octamethylcyclotetrasiloxane) and nitrogen-containing compounds (pyrrole, pyridine, and aniline) as monomers under the same conditions including reaction apparatus, input power, and monomer pressure. The structures of plasma polymers were discussed with FT-IR, and they were almost the same as those reported in the literature. Moreover, the initial formation process of the plasma thin films was observed with AFM, and there were clear differences in the initial stages of plasma polymerization depending on the monomer structures.