抄録
We report fabrication of three-dimensional (3-D) microchannels inside transparent materials. The 3-D microfabrication was achieved by two steps. First, femtosecond pulses were focussed into the transparent materials, and continuous spots of 3-D micro modification were made. The modified spots were made along with a programmed pattern by scanning the sample. Next, the materials were immersed in aqueous solution of HF-based etchant. The difference in etching rate between raw- and modified-regions results in the 3-D microchannel. By this method, 3-D microchannels were fabricated in the materials without special photo-sensitivity such as silica glass and sapphire. In addition, one-step fabrication (without etching) was achieved in a polymer material of PMMA.
