抄録
The design concept and fabrication process for the high density optical memory has been studied with an emphasis on the monolithic integration process as well as the nano-aperture probe array of optical throughput enhancement. The process of compact near-field optical head includes the microfabrication of nano-aperture probe of high optical efficiency and the monolithic lithography integration of microlens array on the VCSELs using a UV-molding. The evaluation result shows the strong possibility of applying the proposed near-field optical head to the future high density optical memory.
