抄録
The development of a reliable high power EUV light source is one of the major technical challenges for the implementation of EUV lithography. A review is given on the development of a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. An LPP source is the most promising ap-proach to generate the required in-band EUV power level. Our source is based on a high power, high repetition rate CO2 laser system, a tin target and magnetic plasma guiding for collector mirror lifetime enhancement.EUV in-band power equivalent to 60W at intermediate focus was produced by irradiating a tin rotating plate with 6kW laser power. Collector mirror life can be extended by using droplet target and magnetic plasma guiding. The effectiveness of this approach is examined by monitoring the motion of fast Sn ion in a large vacuum chamber.
